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WEDNESDAY, June 15, 2005, 10:30 AM - 12:00 PM | Room: 210AB
TOPIC AREA:  DESIGN FOR MANUFACTURING (mixed tools and methods)

   SESSION 23
  Design Methods for Manufacturability Enhancements
  Chair: Nagib Z. Hakim - Intel Corp., Santa Clara, CA
  Organizers: David Blaauw, Michael Orshansky

  As we sink further below the 100 nm barrier, more second order effects are entering the design/manufacturing interface. Optical Proximity Correction, Focus Variations, and other Resolution Enhancement Techniques conspire to lengthen the design and verification processes. The papers in this session attack this area from two distinct directions: from the design side using regularity - or from the CAD side developing algorithms that are aware of these effects.

    23.1   Design Methodology for IC Manufacturability Based on Regular Logic-Bricks
  Speaker(s): Veerbhan Kheterpal - Carnegie Mellon Univ., Pittsburgh, PA
  Author(s): Veerbhan Kheterpal - Carnegie Mellon Univ., Pittsburgh, PA
Vyacheslav V. Rovner - Carnegie Mellon Univ., Pittsburgh, PA
Thiago G. Hersan - Carnegie Mellon Univ., Pittsburgh, PA
Dipti Motiani - Carnegie Mellon Univ., Pittsburgh, PA
Yoichi Takegawa - Carnegie Mellon Univ., Pittsburgh, PA
Andrzej J. Strojwas - Carnegie Mellon Univ., Pittsburgh, PA
Lawrence T. Pileggi - Carnegie Mellon Univ., Pittsburgh, PA
    23.2Advanced Timing Analysis Based on Post-OPC Extraction of Critical Dimensions
  Speaker(s): Jie Yang - Univ. of Michigan, Ann Arbor, MI
  Author(s): Jie Yang - Univ. of Michigan, Ann Arbor, MI
Luigi Capodieci - Advanced Micro Devices, Inc., Sunnyvale, CA
Dennis M. Sylvester - Univ. of Michigan, Ann Arbor, MI
    23.3sSelf-compensating Design for Focus Variation
  Speaker(s): Youngmin Kim - Univ. of Michigan, Ann Arbor, MI
  Author(s): Puneet Gupta - Blaze DFM Inc., Sunnyvale, CA
Andrew B. Kahng - Blaze DFM Inc. & Univ. of California at San Diego, La Jolla, CA
Youngmin Kim - Univ. of Michigan, Ann Arbor, MI
Dennis M. Sylvester - Univ. of Michigan, Ann Arbor, MI
    23.4sRADAR: RET-Aware Detailed Routing Using Fast Lithography Simulations
  Speaker(s): Joydeep Mitra - Univ. of Texas, Austin, TX
  Author(s): Joydeep Mitra - Univ. of Texas, Austin, TX
Peng Yu - Univ. of Texas, Austin, TX
David Z. Pan - Univ. of Texas, Austin, TX