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Video Results for 48th DAC (2011)


CONVENED THURSDAY, June 09, 2011, 2:00 PM - 3:30 PM
VIDEO: SESSION 43
TOPIC AREA: DFM AND THE MANUFACTURING INTERFACE
PANEL: Double Trouble or Double Your Fun: Double-Patterning and Variability
Chair:
Joe Sawicki - Mentor Graphics Corporation, Willsonville, OR

Organizer:
Nagaraj NS - Texas Instruments, Inc., Dallas, TX

The semiconductor industry faces extraordinary uncertainties at 20nm. The most pressing is what type of double-patterning to use and its impact on the entire flow. In addition, new device architectures and the explosion of variability and reliability effects must be managed. Panelists will discuss the critical risk factors at 20nm, the solutions that make the most dollars (and sense), and who should deliver those solutions.


Speakers:
Lars Liebmann - IBM Corp., Hopewell Junction, NY
Suk Lee - Taiwan Semiconductor Manufacturing Co., Ltd., San Jose, CA
Deepak Sherlekar - Synopsys, Inc., Fremont, CA
Rob Aitken - ARM, Inc., San Jose, CA
Diederik Verkest - IMEC, Leuven, Belgium
Jean-Pierre Geronimi - STMicroelectronics, Crolles, France